Waste gas cleaner for semiconductors

With our accumulated know-how and field-proven skills related to waste gas treatment essential to the manufacturing of semiconductors, and thanks to a variety of technical innovations and cutting-edge equipment, we can meet increasingly diversified needs.

Ammonia Decomposition and Detoxifying Equipment MODEL-WGA

Model WGA(NH3 decomposition and detoxifying equipment) is primarily intended for treatment of waste gas from the GaN manufacturing process.
An effective combination of ordinary-temperature dry detoxification and catalyst decomposition based-detoxification ensures lower running costs, easier maintenance and less environmental impact.


  • Model WGA detoxifying equipment is designed to decompose NH3 by means of a catalyst into nitrogen and hydrogen, thereby achieving full detoxification.
  • Causes no NOx emission which can be the byproduct of NH3 detoxification by oxidization.
  • Because it is not a burner type (combustion type), there is no need for propane supply equipment and drainage system. (However, A20 uses a water-cooled decomposition column.)
  • Ensures that the target harmful gases in the detoxified gas are removed to ACGIH/TLV-TWA in concentration.
  • The adsorption and regeneration type does not require replacement of the after-treatment column detoxifying agent, yielding lower running costs.

Equipment specifications

Equipment dimensions W×D×H(mm)
After-treatment method Inlet NH3 flow rate
Inlet total flow rate
A3 decomposition column
(dry detoxification type)
12.4 37.6
A5 decomposition column
(dry detoxification type)
20.6 62.4
A10 decomposition column
(dry detoxification type)
35 115
A20 decomposition column
(dry detoxification type)
82.6 250.4
A20 decomposition column
(regeneration type)

Flow Diagram (After-Treatment Method: Dry Detoxification)

Flow Diagram (After-Treatment Method: Adsorption and regeneration)

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