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Other semiconductor gas purifying eauipment

 

Piofine Cartridge (Gas Purifying Cartridge) MODEL-PF

Features

  • Use of oxygen scavengers and dehumidifying agents that we have developed ourselves enables excellent performance by this cartridge in refining gases for all types of semiconductors.
  • The cartridge is compact with the refining column, high performance filter and diaphragm valves located in one structure. This means that the cartridge can be used close to point of use.
  • The high performance filter and the baking that occurs before delivery are part of the overall plan that is implemented for particles and degassing.
  • There are no special utility parts. The final processing of used cartridges occurs at our premises.(The N, F and B models can be regenerated.)

Equipment performance

Model PF- H,A,N
Applicable gas According to table of applicable gases below.
Inlet Outlet
Max. pressure(MPa) 0.5 Under ⊿0.1
Temp.(℃) 5～35 5～35
Impurities
(vol.ppb)		 O2 500 ≦10
H2O※1 1,000 ≦13

*1 The results for acidic gas and ammonia gas are those from purification of a model gas (N2 gas containing H20 1,000 ppb).
* The particle removal rate is 99.9999999％ or more for particles of 0.01um or more in size.

Model PF- B
Applicable gas According to table of applicable gases below.
Inlet Outlet
Max. pressure(MPa) 0.5 Under ⊿0.1
Temp.(℃) 5～35 5～35
Impurities
(vol.ppb)		 O2 500 ≦1
CO 500 ≦1
CO2 100 ≦1
H2 1,000 ≦1
H2O 1,000 ≦1

* Can also be used for a refined gas purity of 0.1ppb (using an all-metal diaphragm valve).
* The particle removal rate is 99.9999999％ or more for particles of 0.01um or more in size.

Type

Type Purified gas flow rate
(ℓ/min(nor))		 Purification capacity(m3(nor))※2 Weight
(kg)
H,N A B
PF-05-□※1 0.5 80 40 160 1.8
PF-2-□ 2.0 240 120 480 3.5
PF-10-□ 10.0 1,200 600 2,400 8.5

*1 □indicates the applicable gas (H, A, F, N, or B).
*2 In the case of a mixture, this includes the balance gas.
Reference: The amount of gas in a 47ℓ cylinder charged at 8.5 MPa is approximately 4m3(nor).

Applicable gas

H Type AsH3, PH3, SiH4, Si2H6, H2S, H2Se, etc
A Type HCl, BF3, SiF4, SiH2Cl2, HBr, etc
N Type NH3, (CH3)2NH, etc
B Type N2, He, Ar, H2, etc

* For gases other than the above, please consult with us

 

Line Filter XLF-M0.01μm-Capable Compact Teflon Membrane

Features

  • The high-performance in-line gas filters have been developed as gas filters for semiconductors based on our proprietary technical know-how regarding clean gas delivery systems.

Line Filter XLF-M0.01μm-Capable Compact Teflon Membrane

Specifications

Maximum service pressure:
0.98MPa(9.8kgf/cm2G)
Maximum service pressure difference:
0.3MPa(3kgf/cm2)*
Maximum allowable back pressure:
0.1MPa(1kgf/cm2)
Maximum service temp.:
130℃
Filter effective surface area:
12cm2
He leak rate:
0.01μm 99.999999% or more
Removal rate for uniform particle sizes:
0.01μm 99.999999% or more
0.05μm 99.999999% or more
.10μm 99.999999% or more
Material:
Body: SUS316L
Surface treatment: Special electrolytic polishing finish
Element: PTFE membrane
Element support: PFA

Flow rate characteristics

* No particle leakage was found up to the maximum service pressure difference. However use at a pressure difference of 0.02 MPa or less is recommended in order to further improve the reliability of particle removal.
Note: Pressure units are converted using the formula 1 kgf/cm2G = 0.1 MPa.

Model list

Model Connection joint Surface
treatment		 L（mm）
XLF-D-V2P 1/4”VCR Type Special electrolytic polishing finish 127
XLF-D-V3P 3/8”VCR Type
XLF-D-S2P 1/4”Swagelok Type 126*
XLF-D-S3P 3/8”Swagelok Type 132*

* The dimension indicated for the Swagelok type includes the cap nut.

ULF-B06 0.09μm General-Purpose Compact Teflon Membrane

Specifications

Maximum service pressure:
0.98MPa(9.8kgf/cm2G)
Maximum service pressure difference:
0.01MPa(0.1kgf/cm2)*
Maximum allowable back pressure:
0.1MPa(1kgf/cm2)
Maximum service temp.:
100℃
Filter effective surface area:
10cm2
Removal rate for uniform particle sizes:
0.09μm 99.999999% or more
Material：
Body: SUS316
Element: PTFE membrane
Element support: ETFE
O-ring: Viton (standard) *2

*1 Avoid using at or above the maximum service pressure difference.
*2 If another material is preferred, please consult with us.
* If the filter will be used with special material gases, select the XLF model.
Note: Pressure units are converted using the formula 1 kgf/cm2G = 0.1 MPa.

Model list

Model Connection joint L（mm）
ULF-B06-W2-V 1/4”Swagelok Type 145*
ULF-B06-W3-V 3/8”Swagelok Type 150*

* Dimension includes the cap nut.

 

Mass Flow Controller

Features

  • The SEC series mass flow controllers are made in Japan.
    The high performance thermal mass flow controllers were developed with HORIBA STEC flowrate measurement technologies.
    By the high performance flow rate sensor and flow rate cotrol valve, The flow rate is controlled to the set value given by an electric signal from the outside and not affected by changes in the environment or fluctuations in supply pressure.
    We can also provide digital mass flow controllers equipped with a CPU to support higher accuracy and multiple functions.

Z500 series

Features

  • High accuracy ± 1.0S.P.
  • High speed response（T98）
  • Multi-gas / multi-range solution

Specifications

Full-scale Flow Rate 10SCCM〜50SLM 100SLM、200SLM 300SLM、500SLM
Accuracy ±1.0%S.P.
（Flow rate＞25%F.S.）
±0.25%F.S.
（Flow rate≦25%F.S.）		 ±1.0%S.P.
（Flow rate＞35%F.S.）
±0.35%F.S.
（Flow rate≦35%F.S.）		 ±2.0% S.P.
（Flow rate＞50%F.S.）
±1.0%F.S.
（Flow rate≦50%F.S.）
Power Supply ±15VDC
±24VDC（Z504、Z507series）
Communication Interface Analog（0-5VDC）
Digita（l RS-485 F-net）
DeviceNet™
EtherCAT®

SEC-E series

SEC-E series products are general purpose mass flow controllers with the high reliability thermal sensor and solenoid valve. Its performances are equivalent to the upper grade models.

Feastures

  • Basic model with high accuracy, high speed response and high reliablity
  • MK3 type pursues high cost-performance by limiting calibration gases. (Calibration gas: N2／O2／Air／H2／He／Ar）
  • Large flow model （E431X／E441X）can be used up to 200 slm.

Specifications

Standard Flow Rate Range SEC-E40 10SCCM〜10SLM
SEC-E50 20SLM〜30SLM		 SEC-E431X 50SLM〜100SLM
SEC-E441X
Flow Rate Control 2〜100%F.S. 5〜100%F.S.
Accuracy ±1%F.S.
Power Supply ±15VDC
Communication Interface Analog（0-5VDC）

 

Gas Mixer (MU-3000 Series)

Features

  • Supply stable gas concentration
  • Applicable to various gases
    Introduce multi-gas, multi-range solution
    It is possible for the user to change the type of gas or full-scale flow rate on site.
  • Easy operation via the special software

Specifications

Model MU (2 Line, 3 Line, 4 Line, 5 Line and 6 Line)
Maxium Flow Rate 50SLM
Mounted MFC SEC-N102 series (Max 6 Line)
Type of Gases Please contact us if you consider using corrosive gases
Flow Rate 2〜100% F.S.
Wetted Material SUS304, SUS316, FKM
Accuracy ±1% S.P.
Repeatability ±0.2% F.S.
Linearity ±0.5% F.S.
Supply Pressure 0.1〜0.45MPa(G)
Downstream Atomospheric pressure ～0.25MPa(G)
Setting Method (Flow Rate) Programmed by the dedicated software
Setting Method (Concentration) Programmed by the dedicated software
Control Programmed by the dedicated software
Power Supply AC100V 50/60Hz

 

Capacitance Manometer (VG Series)

 

Features

  • Self temperateure adjustment type capacitance manometer
  • The world's smallest size
  • High performance and high stablitiy resulting from innovative electrode structure
  • Excellent corrosion resistance

Application

  • Vacuum dry chamber
    LIB(Lithium ion battery electrode), FPD(Flat panel display) Chamber vacuum monitoring after solvent applying

Specifications

Measurement Range 1 Torr F.S. 10/100/1000 Torr F.S.
Heater Set Temperature 55°C/100°C
Accuracy 0.5% R.S. 0.25% R.S.
Power Supply ±24V or ±15V

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