{"id":563,"date":"2021-11-10T14:25:28","date_gmt":"2021-11-10T05:25:28","guid":{"rendered":"https:\/\/www.japan-pionics.co.jp\/?page_id=563"},"modified":"2021-11-10T14:30:06","modified_gmt":"2021-11-10T05:30:06","slug":"etc","status":"publish","type":"page","link":"https:\/\/www.japan-pionics.co.jp\/en\/products\/etc\/","title":{"rendered":"Other semiconductor gas purifying eauipment"},"content":{"rendered":"
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 <\/p>\n

Piofine Cartridge (Gas Purifying Cartridge) MODEL-PF<\/h1>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>
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Features<\/h3>\n
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  • Use of oxygen scavengers and dehumidifying agents that we have developed ourselves enables excellent performance by this cartridge in refining gases for all types of semiconductors.<\/li>\n
  • The cartridge is compact with the refining column, high performance filter and diaphragm valves located in one structure. This means that the cartridge can be used close to point of use.<\/li>\n
  • The high performance filter and the baking that occurs before delivery are part of the overall plan that is implemented for particles and degassing.<\/li>\n
  • There are no special utility parts. The final processing of used cartridges occurs at our premises.(The N, F and B models can be regenerated.)<\/li>\n<\/ul>\n<\/div>\n<\/div><\/div><\/div>
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    \t\"\"<\/p>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>

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    Equipment performance<\/h4>\n
    \n\n\n\n\n\n\n\n\n\n
    Model PF-<\/th>\nH,A,N<\/td>\n<\/tr>\n
    Applicable gas<\/th>\nAccording to table of applicable gases below.<\/td>\n<\/tr>\n
    Inlet<\/td>\nOutlet<\/td>\n<\/tr>\n
    Max. pressure(MPa)<\/th>\n0.5<\/td>\nUnder \u22bf0.1<\/td>\n<\/tr>\n
    Temp.(\u2103)<\/th>\n5\uff5e35<\/td>\n5\uff5e35<\/td>\n<\/tr>\n
    Impurities
    \n(vol.ppb)<\/th>\n    		O2<\/span><\/th>\n500<\/td>\n\u226610<\/td>\n<\/tr>\n
    H2<\/span>O\u203b1<\/sup><\/th>\n1,000<\/td>\n\u226613<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

    *1 The results for acidic gas and ammonia gas are those from purification of a model gas (N2 gas containing H20 1,000 ppb).
    \n* The particle removal rate is 99.9999999\uff05 or more for particles of 0.01um or more in size.<\/p>\n

    \n\n\n\n\n\n\n\n\n\n\n\n\n
    Model PF-<\/th>\nB<\/td>\n<\/tr>\n
    Applicable gas<\/th>\nAccording to table of applicable gases below.<\/td>\n<\/tr>\n
    Inlet<\/td>\nOutlet<\/td>\n<\/tr>\n
    Max. pressure(MPa)<\/th>\n0.5<\/td>\nUnder \u22bf0.1<\/td>\n<\/tr>\n
    Temp.(\u2103)<\/th>\n5\uff5e35<\/td>\n5\uff5e35<\/td>\n<\/tr>\n
    Impurities
    \n(vol.ppb)<\/th>\n    		O2<\/span><\/th>\n500<\/td>\n\u22661<\/td>\n<\/tr>\n
    CO<\/th>\n500<\/td>\n\u22661<\/td>\n<\/tr>\n
    CO2<\/span><\/th>\n100<\/td>\n\u22661<\/td>\n<\/tr>\n
    H2<\/span><\/th>\n1,000<\/td>\n\u22661<\/td>\n<\/tr>\n
    H2<\/span>O<\/th>\n1,000<\/td>\n\u22661<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

    * Can also be used for a refined gas purity of 0.1ppb (using an all-metal diaphragm valve).
    \n* The particle removal rate is 99.9999999\uff05 or more for particles of 0.01um or more in size.<\/p>\n<\/div>\n<\/div><\/div>

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    Type<\/h4>\n
    \n\n\n\n\n\n\n\n
    Type<\/th>\nPurified gas flow rate
    \n(\u2113\/min(nor))<\/strong><\/td>\n    		Purification capacity(m3<\/sup>(nor))\u203b2<\/sup><\/strong><\/td>\nWeight
    \n(kg)<\/strong><\/td>\n<\/tr>\n
    H,N<\/strong><\/td>\nA<\/strong><\/td>\nB<\/strong><\/td>\n<\/tr>\n
    PF-05-\u25a1\u203b1<\/sup><\/th>\n0.5<\/td>\n80<\/td>\n40<\/td>\n160<\/td>\n1.8<\/td>\n<\/tr>\n
    PF-2-\u25a1<\/th>\n2.0<\/td>\n240<\/td>\n120<\/td>\n480<\/td>\n3.5<\/td>\n<\/tr>\n
    PF-10-\u25a1<\/th>\n10.0<\/td>\n1,200<\/td>\n600<\/td>\n2,400<\/td>\n8.5<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

    *1 \u25a1indicates the applicable gas (H, A, F, N, or B).
    \n*2 In the case of a mixture, this includes the balance gas.
    \nReference: The amount of gas in a 47\u2113 cylinder charged at 8.5 MPa is approximately 4m3(nor).<\/p>\n<\/div>\n<\/div><\/div>

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    Applicable gas<\/h4>\n
    \n\n\n\n\n\n\n
    H Type<\/th>\nAsH3<\/span>, PH3<\/span>, SiH4<\/span>, Si2<\/span>H6<\/span>, H2<\/span>S, H2<\/span>Se, etc<\/td>\n<\/tr>\n
    A Type<\/th>\nHCl, BF3<\/span>, SiF4<\/span>, SiH2<\/span>Cl2<\/span>, HBr, etc<\/td>\n<\/tr>\n
    N Type<\/th>\nNH3<\/span>, (CH3<\/span>)2<\/span>NH, etc<\/td>\n<\/tr>\n
    B Type<\/th>\nN2<\/span>, He, Ar, H2<\/span>, etc<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

    * For gases other than the above, please consult with us<\/p>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>

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     <\/p>\n

    Line Filter XLF-M0.01\u03bcm-Capable Compact Teflon Membrane<\/h1>\n
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    Features<\/h3>\n
      \n
    • The high-performance in-line gas filters have been developed as gas filters for semiconductors based on our proprietary technical know-how regarding clean gas delivery systems.<\/li>\n<\/ul>\n<\/div>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>
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      Line Filter XLF-M0.01\u03bcm-Capable Compact Teflon Membrane<\/h2>\n

      Specifications<\/h3>\n
      \n
      Maximum service pressure:<\/dt>\n
      0.98MPa(9.8kgf\/cm2<\/sup>G)<\/dd>\n
      Maximum service pressure difference:<\/dt>\n
      0.3MPa(3kgf\/cm2<\/sup>)*<\/dd>\n
      Maximum allowable back pressure:<\/dt>\n
      0.1MPa(1kgf\/cm2<\/sup>)<\/dd>\n
      Maximum service temp.:<\/dt>\n
      130\u2103<\/dd>\n
      Filter effective surface area:<\/dt>\n
      12cm2<\/sup><\/dd>\n
      He leak rate:<\/dt>\n
      0.01\u03bcm 99.999999% or more<\/dd>\n
      Removal rate for uniform particle sizes:<\/dt>\n
      0.01\u03bcm 99.999999% or more
      \n0.05\u03bcm 99.999999% or more
      \n.10\u03bcm 99.999999% or more<\/dd>\n<\/dl>\n
      \n
      Material:<\/dt>\n
      Body: SUS316L
      \nSurface treatment: Special electrolytic polishing finish
      \nElement: PTFE membrane
      \nElement support: PFA<\/dd>\n<\/dl>\n<\/div>\n<\/div><\/div><\/div>
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      \t\"\"<\/p>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>

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      Flow rate characteristics<\/h4>\n

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      \"\"<\/p>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>

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      * No particle leakage was found up to the maximum service pressure difference. However use at a pressure difference of 0.02 MPa or less is recommended in order to further improve the reliability of particle removal.
      \nNote: Pressure units are converted using the formula 1 kgf\/cm2G = 0.1 MPa.<\/p>\n<\/div>\n<\/div><\/div>

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      Model list<\/h4>\n
      \n\n\n\n\n\n\n\n
      Model<\/th>\nConnection joint<\/th>\nSurface
      \ntreatment<\/th>\n      		L\uff08mm\uff09<\/th>\n<\/tr>\n
      XLF-D-V2P<\/td>\n1\/4\u201dVCR Type<\/td>\nSpecial electrolytic polishing finish<\/td>\n127<\/td>\n<\/tr>\n
      XLF-D-V3P<\/td>\n3\/8\u201dVCR Type<\/td>\n<\/tr>\n
      XLF-D-S2P<\/td>\n1\/4\u201dSwagelok Type<\/td>\n126*<\/td>\n<\/tr>\n
      XLF-D-S3P<\/td>\n3\/8\u201dSwagelok Type<\/td>\n132*<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

      * The dimension indicated for the Swagelok type includes the cap nut.<\/p>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>

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      ULF-B06 0.09\u03bcm General-Purpose Compact Teflon Membrane<\/h2>\n

      Specifications<\/h3>\n
      \n
      Maximum service pressure:<\/dt>\n
      0.98MPa(9.8kgf\/cm2<\/sup>G)<\/dd>\n
      Maximum service pressure difference:<\/dt>\n
      0.01MPa(0.1kgf\/cm2<\/sup>)*<\/dd>\n
      Maximum allowable back pressure:<\/dt>\n
      0.1MPa(1kgf\/cm2<\/sup>)<\/dd>\n
      Maximum service temp.:<\/dt>\n
      100\u2103<\/dd>\n
      Filter effective surface area:<\/dt>\n
      10cm2<\/sup><\/dd>\n
      Removal rate for uniform particle sizes:<\/dt>\n
      0.09\u03bcm 99.999999% or more<\/dd>\n<\/dl>\n
      \n
      Material\uff1a<\/dt>\n
      Body: SUS316
      \nElement: PTFE membrane
      \nElement support: ETFE
      \nO-ring: Viton (standard) *2<\/dd>\n<\/dl>\n<\/div>\n<\/div><\/div><\/div>
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      \t\"\"<\/p>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>

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      *1 Avoid using at or above the maximum service pressure difference.
      \n*2 If another material is preferred, please consult with us.
      \n* If the filter will be used with special material gases, select the XLF model.
      \nNote: Pressure units are converted using the formula 1 kgf\/cm2G = 0.1 MPa.<\/p>\n<\/div>\n<\/div><\/div>

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      Model list<\/h4>\n
      \n\n\n\n\n\n
      Model<\/th>\nConnection joint<\/th>\nL\uff08mm\uff09<\/th>\n<\/tr>\n
      ULF-B06-W2-V<\/td>\n1\/4\u201dSwagelok Type<\/td>\n145*<\/td>\n<\/tr>\n
      ULF-B06-W3-V<\/td>\n3\/8\u201dSwagelok Type<\/td>\n150*<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n

      * Dimension includes the cap nut.<\/p>\n<\/div>\n<\/div><\/div><\/div><\/div><\/div>

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       <\/p>\n

      Mass Flow Controller<\/h1>\n
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      Features<\/h3>\n